In order to transmit light at high efficiently, a high reflectivity is required for the micro-mirror. Accordingly, the micro-mirror is a key part determining the characteristics of the device. One of the devices described above has a micro-mirror for scanning of light and switching of optical channels by driving the micro-mirror. The technique described above has been utilized in image processing apparatus such as scanners and micro mirror array displays, and in the field of information communication such as read/write devices for use in micro miniature high density optical memories. Particularly, application of the MEMS technology to the optical technology has been developed remarkably in recent years. MEMS (Micro Electro Mechanical System) technique have been developed remarkably in recent years by the application of the semiconductor micro-fabrication. The present invention concerns a method of manufacturing a mirror by fabricating a silicon substrate and a mirror device manufactured by using the manufacturing method. A mirror device according to claim 53 wherein the reflection surfaces of the micro-mirrors comprise identical crystal faces. A mirror device comprising: a pair of micro-mirrors each fabricated by forming a mask material on a surface of a semiconductor substrate, anisotropically dry etching the semiconductor substrate to form a surface disposed substantially parallel with a crystal face perpendicular to the surface of the semiconductor substrate, and anisotropically wet etching the semiconductor substrate including the crystal face and the surface disposed substantially parallel with the crystal face, thereby providing each of the micro-mirrors with a reflection surface disposed at an angle of 90° relative to one another and relative to the surface of the semiconductor substrate.ĥ4. An optical mirror device according to claim 43 wherein the first and second reflection surfaces of the micro-mirrors are disposed at an angle of 90° relative to one another so that an optical path of the light emitted by the optical fiber and received by the first reflection surface is parallel to an optical path of the light reflected by the second reflection surface and received by the detector.ĥ3. An optical mirror device according to claim 43 further comprising a multi-layered dielectric film formed on each of the first and second surfaces of the mirror.ĥ2. An optical mirror device according to claim 48 wherein the thin film comprises at least one layer of a dielectric material.ĥ1.
An optical device according to claim 48 wherein the thin film comprises at least one layer of a metal film.ĥ0. An optical device according to claim 43 further comprising a thin film having high reflectivity formed on each of the first and second surfaces of the mirror.Ĥ9. A mirror device according to claim 34 wherein the surface of the semiconductor substrate is a crystal face.Ĥ8. A mirror device according to claim 34 wherein the reflection surfaces of the micro-mirrors comprise identical crystal faces.ģ6. A mirror device comprising: a semiconductor substrate and a pair of micro-mirrors disposed on a surface of the semiconductor substrate, each of the micro-mirrors having a reflection surface disposed at an angle of 90° relative to one another and relative to the surface of the semiconductor substrate.ģ5.
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